Lithographic apparatus and device manufacturing method
US7738074B2 · kind B2 · utility
46Cited by
30References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2004 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Aug 15, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.