Optical components, illumination systems, and methods

US7738160B2 · kind B2 · utility

Assignee

• Infineon Technologies AG · DE

Inventors

• Jens Schneider · Bielefeld, DE
• Vlad Temchenko · Dresden, DE

Key dates

• Filing date: May 14, 2007
• Grant date: Jun 15, 2010
• Expiry date: Jan 29, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70116
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Lithography aperture lenses, illumination systems, and methods are disclosed. In a preferred embodiment, a lens includes a substantially transparent material and an electro-optical material disposed proximate the substantially transparent material, wherein the lens is a lens for an illuminator of a lithography system.