Patent · US Active

Data flow management in generating profile models used in optical metrology

US7783669B2 · kind B2 · utility

9Cited by

6References

17Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Hong Qiu · Union City, US
Junwei Bao · Los Altos, US
Wei Liu · Jinan, CN
Jeffrey A. Chard · Sunnyvale, US
Miao Liu · Beijing, CN
Gang He · Magnolia Trace, CA
Hemalatha Erva · Fremont, US
Vi Vuong · Fremont, US

Key dates

Filing date	Oct 12, 2006
Grant date	Aug 24, 2010
Priority date	—
Expiry date	Feb 5, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/24
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data objec…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.