Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
US7794544B2 · kind B2 · utility
36Cited by
258References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2007 |
| Grant date | Sep 14, 2010 |
| Priority date | — |
| Expiry date | Oct 26, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/2087
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.