High speed phase scrambling of a coherent beam using plasma
US7795816B2 · kind B2 · utility
7Cited by
5References
17Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 8, 2007 |
| Grant date | Sep 14, 2010 |
| Priority date | — |
| Expiry date | Jun 17, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A laser beam is modulated at a very high frequency to produce uniform radiant flux densities on substrate surface processing regions during thermal processing. Beam modulation is achieved by passing the laser beam through a plasma which causes phase randomization within the laser beam. This method may be used for any application where intense, uniform illumination is desired, such as pulsed laser annealing, ablating, and wafer stepper illuminating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.