Test structure for OPC-related shorts between lines in a semiconductor device
US7800106B2 · kind B2 · utility
7Cited by
24References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 2007 |
| Grant date | Sep 21, 2010 |
| Priority date | — |
| Expiry date | Apr 25, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
OPC results may be efficiently evaluated on the basis of a test structure containing a plurality of line features with opposing end portions. Thus, for different line parameters, the effect of OPC may be determined for a given critical tip-to-tip distance by determining the leakage behavior of the test assemblies, each having different design parameter values for line width and lateral distance between adjacent lines.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.