EUV reticle handling system and method
US7804583B2 · kind B2 · utility
5Cited by
15References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2008 |
| Grant date | Sep 28, 2010 |
| Priority date | — |
| Expiry date | Sep 30, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70741
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.