Graded spin-on organic antireflective coating for photolithography
US7816069B2 · kind B2 · utility
4Cited by
34References
8Claims
0Family size
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Key dates
| Filing date | Jun 23, 2006 |
| Grant date | Oct 19, 2010 |
| Priority date | — |
| Expiry date | Jun 23, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.