Cathode liner with wafer edge gas injection in a plasma reactor chamber
US7832354B2 · kind B2 · utility
9Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2007 |
| Grant date | Nov 16, 2010 |
| Priority date | — |
| Expiry date | Jul 15, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/19042
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The disclosure concerns a wafer support for use in a plasma reactor chamber, in which the wafer support has a wafer edge gas injector adjacent and surrounding the wafer edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.