Patent · US Active

Projection objective for lithography

US7835073B2 · kind B2 · utility

1Cited by

1References

21Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Heiko Feldmann · Aalen, DE
Susanne Beder · Aalen, DE
Aurelian Dodoc · Heidenheim an der Brenz, DE
Alexander Epple · Aalen, DE
Hans-Juergen Rostalski · Oberkochen, DE

Key dates

Filing date	Jan 15, 2008
Grant date	Nov 16, 2010
Priority date	—
Expiry date	Jan 8, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70308
WIPO fieldOptics
WIPO sectorInstruments

Abstract

In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.