Variable seal pressure slit valve doors for semiconductor manufacturing equipment
US7841582B2 · kind B2 · utility
2Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2004 |
| Grant date | Nov 30, 2010 |
| Priority date | — |
| Expiry date | Feb 3, 2029 |
Classification
- Technology area (CPC E)Fixed Constructions
- CPC primaryE05Y2800/12
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. A sealing member seals the opening when a door is in a closed position. To selectively open and close the opening, an actuator moves the door. A valve actuator switch provides a first or second pressure to the actuator depending on the pressure inside a first chamber. In one embodiment, a sensor monitors the pressure inside the first chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.