Patent · US Active

Method of making an integrated circuit including electrodeposition of metallic chromium

US7909978B2 · kind B2 · utility

0Cited by

4References

16Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Johannes Lodermeyer · Kinding, DE
Edmund Riedl · Bergneustadt, DE
Werner Robl · Regensburg, DE

Key dates

Filing date	Apr 19, 2007
Grant date	Mar 22, 2011
Priority date	—
Expiry date	Dec 5, 2029

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC25D21/04
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of making an integrated circuit including a composition of matter for electrodepositing of chromium is disclosed. One embodiment provides a bath having a solution of a chromium salt in a substantially anhydrous organic solvent, to uses of certain chromium salts for electrodepositing and to processes for electrodepositing chromium.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.