Patent · US Active

Reticle for use in a semiconductor lithographic system and method for modifying the same

US7910265B2 · kind B2 · utility

0Cited by

0References

21Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Vlad Temchenko · Dresden, DE
Jens Schneider · Bielefeld, DE

Key dates

Filing date	Mar 14, 2008
Grant date	Mar 22, 2011
Priority date	—
Expiry date	Apr 2, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70433
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A reticle for use in a semiconductor lithographic system includes at least two separated reticle parts. Each part includes a pattern to be transferred lithographically to a substrate. At least one of the two separated reticle parts is independently replaceable.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.