Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
US7925486B2 · kind B2 · utility
12Cited by
7References
18Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 13, 2007 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Mar 13, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/44
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout are provided. One computer-implemented method for creating a metrology target structure design for a reticle layout includes simulating how one or more initial metrology target structures will be formed on a wafer based on one or more fabrication processes that will be used to form a metrology target structure on the wafer and one or more initial metrology target structure designs. The method also includes creating the metrology target structure design based on results of the simulating step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.