Lithographic apparatus and device manufacturing method
US7936444B2 · kind B2 · utility
26Cited by
38References
35Claims
0Family size
Assignee
Inventors
- Bob Streefkerk
- Johannes Jacobus Matheus Baselmans
- Henrikus Herman Marie Cox
- Antonius Theodorus Anna Maria Derksen
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Joeri Lof
- Erik Roelof Loopstra
- Jeroen Johannes Sophia Maria Mertens
- Frits Van Der Meulen
- Johannes Catharinus Hubertus Mulkens
- Gerardus Petrus Matthijs Van Nunen
- Klaus Simon
- Bernardus Antonius Slaghekke
- Alexander Straaijer
- Jan-Gerard Cornelis Van Der Toorn
- Martijn Houkes
Key dates
| Filing date | Feb 7, 2008 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Dec 29, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.