Altering pattern data based on measured optical element characteristics
US7936445B2 · kind B2 · utility
6Cited by
50References
31Claims
0Family size
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Key dates
| Filing date | Jun 19, 2006 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Oct 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.