Method and apparatus for spacer-optimization (S-O)
US7939450B2 · kind B2 · utility
7Cited by
5References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2007 |
| Grant date | May 10, 2011 |
| Priority date | — |
| Expiry date | Mar 4, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/60
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention can provide a method of processing a substrate using S-O processing sequences and evaluation libraries that can include one or more optimized spacer creation and evaluation procedures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.