Patent · US Active

Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system

US7982854B2 · kind B2 · utility

4Cited by

7References

12Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Hans-Juergen Mann · Oberkochen, DE
Wolfgang Singer · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Olaf Dittmann · Bopfingen, DE
Michael Totzeck · Schwäbisch Gmünd, DE

Key dates

Filing date	Apr 12, 2006
Grant date	Jul 19, 2011
Priority date	—
Expiry date	Nov 27, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70058
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.