Remote plasma source seasoning
US7989365B2 · kind B2 · utility
599Cited by
101References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2009 |
| Grant date | Aug 2, 2011 |
| Priority date | — |
| Expiry date | Oct 22, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of seasoning a remote plasma system are described. The methods include the steps of flowing a silicon-containing precursor into a remote plasma region to deposit a silicon containing film on an interior surface of the remote plasma system. The methods reduce reactions with the seasoned walls during deposition processes, resulting in improved deposition rate, improved deposition uniformity and reduced defectivity during subsequent deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.