Method of performing mask-writer tuning and optimization
US8056028B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2009 |
| Grant date | Nov 8, 2011 |
| Priority date | — |
| Expiry date | May 5, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/76
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A model-based tuning method for tuning a first mask writer unit utilizing a reference mask writer unit, each of which has tunable parameters for controlling mask writing performance. The method includes the steps of defining a test pattern and a mask writing model; generating the test pattern utilizing the reference mask writer unit and measuring the mask writing results; generating the test pattern utilizing the first mask writer unit and measuring the mask writing results; calibrating the mask writing model utilizing the mask writing results corresponding to the reference mask writer unit, where the calibrated mask writing model has a first set of parameter values; tuning the calibrated mask writing model utilizing the mask writing results corresponding to the first mask writer unit, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first mask writer unit based on a difference between the first set of parameter values and the second set of parameter values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.