System and method for using first-principles simulation to control a semiconductor manufacturing process
US8073667B2 · kind B2 · utility
8Cited by
36References
67Claims
0Family size
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Key dates
| Filing date | Sep 30, 2003 |
| Grant date | Dec 6, 2011 |
| Priority date | — |
| Expiry date | Dec 30, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/08
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method, system and computer readable medium for controlling a process performed by a semiconductor processing tool includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is then performed using the input data and the physical model to provide a first principles simulation result, and the first principles simulation result is used to control the process performed by the semiconductor processing tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.