System for control of gas injectors
US8088223B2 · kind B2 · utility
9Cited by
59References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2006 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | Aug 6, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing system has computer controlled injectors. The computer is configured to adjust a plurality of injectors, such as during deposition of a graded layer, between depositions of two different layers, or between deposition and chamber clean steps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.