Apparatus for cyclical depositing of thin films

US8123860B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Randhir P. S. Thakur · Boise, US
• Alfred Mak · Union City, US
• Ming Xi · Palo Alto, US
• Walter Glenn · Pacifica, US
• Ahmad Khan · Alpharetta, US
• Ayad A. Al-Shaikh · Santa Clara, US
• Avgerinos V. Gelatos · Scotts Valley, US
• Salvador P. Umotoy · Pittsburg, US

Key dates

• Filing date: Oct 30, 2008
• Grant date: Feb 28, 2012
• Expiry date: Apr 7, 2030

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/6719
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.