Lithographic apparatus and device manufacturing method
US8154708B2 · kind B2 · utility
20Cited by
60References
20Claims
0Family size
Assignee
Inventors
- Joeri Lof
- Hans Butler
- Sjoerd Nicolaas Lambertus Donders
- Aleksey Yurievich Kolesnychenko
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Frank Van Schaik
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Bob Streefkerk
- Erik Theodorus Maria Bijlaart
- Christiaan Alexander Hoogendam
- Helmar Van Santen
- Marcus Adrianus Van De Kerhof
- Mark Kroon
- Arie Jeffrey Den Boef
- Joost Jeroen Ottens
- Jeroen Johannes Sophia Maria Mertens
Key dates
| Filing date | Jul 7, 2006 |
| Grant date | Apr 10, 2012 |
| Priority date | — |
| Expiry date | Mar 1, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.