Method and system for evaluating a variation in a parameter of a pattern
US8160350B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2007 |
| Grant date | Apr 17, 2012 |
| Priority date | — |
| Expiry date | May 13, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and system are presented for evaluating a variation of a parameter of a pattern. The method includes processing data indicative of an aerial intensity image of at least a portion of a patterned article, and determining values of a certain functional of the aerial image intensity for predetermined regions within the at least portion of the patterned article. The values of the aerial image intensity functional are indicative of a variation of at least one parameter of the pattern within the at least portion of the patterned article or are indicative of a variation of at least one parameter of a pattern manufactured by utilizing the patterned article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.