Patent · US Active

Calibration and verification structures for use in optical proximity correction

US8161421B2 · kind B2 · utility

7Cited by

6References

9Claims

0Family size

Assignees

International Business Machines Corporation · US
Infineon Technologies AG · DE

Inventors

Ramya Viswanathan · Wappingers Falls, US
Amr Y. Abdo · Madison, US
Henning Haffner · Pawling, US
Oseo Park · Hopewell Junction, US
Michael E. Scaman · Middletown, US

Key dates

Filing date	Jul 7, 2008
Grant date	Apr 17, 2012
Priority date	—
Expiry date	Feb 2, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/68
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.