Inspection of EUV masks by a DUV mask inspection tool
US8207504B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 2010 |
| Grant date | Jun 26, 2012 |
| Priority date | — |
| Expiry date | Nov 19, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses an EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged to scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and (c) a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.