Patent · US Active

Method and system for aerial imaging of a reticle

US8213024B2 · kind B2 · utility

1Cited by

7References

52Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

Shmuel Mangan · Rehovot, IL
Boris Goldberg · Buffalo Grove, US
Ishai Schwarzband · Or Yehuda, IL
On Haran · Kfar Sava, IL
Michael Ben-Yishay · Netanya, IL
Amir Sagiv · Mevaseret Tsiyon, IL
Chaim Braude · Nes Ziona, IL

Key dates

Filing date	Jul 31, 2007
Grant date	Jul 3, 2012
Priority date	—
Expiry date	May 17, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/95676
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.