Lithographic apparatus and device manufacturing method
US8233134B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2008 |
| Grant date | Jul 31, 2012 |
| Priority date | — |
| Expiry date | Dec 4, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/52
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.