Method and apparatus for extended temperature pyrometry
US8254767B2 · kind B2 · utility
13Cited by
27References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 26, 2009 |
| Grant date | Aug 28, 2012 |
| Priority date | — |
| Expiry date | Sep 24, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention are directed to methods and apparatus for rapid thermal processing of a substrate over an extended temperature range, including low temperatures. Systems and methods for using an extended temperature pyrometry system employing a transmitted radiation detector system are disclosed. Systems combining transmitted radiation detector systems and emitted radiation detector systems are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.