Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
US8259285B2 · kind B2 · utility
4Cited by
19References
25Claims
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Key dates
| Filing date | Dec 14, 2006 |
| Grant date | Sep 4, 2012 |
| Priority date | — |
| Expiry date | Nov 12, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An iterative method of producing optimized setpoint data for controlling the actuation of elements of an array of individually controllable elements in a maskless system and systems therefore. The optimization is based on estimation of a device structure that can utilizes one or more of the following factors: the low-pass characteristics of the projection system, the configuration of the illumination system, and the process window properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.