Patent · US Active

Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same

US8279402B2 · kind B2 · utility

5Cited by

9References

27Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Stephan Six · Aalen, DE
Michael Lill · Kaiserslautern, DE
Ruediger Duesing · Neu-Ulm, DE
Bernhard Gellrich · Aalen, DE
Michael Widmann · Aalen, DE
Andreas Schubert
Tilmann Von Papen · Aalen, DE
Thomas Ihl · Aalen, DE

Key dates

Filing date	Mar 12, 2009
Grant date	Oct 2, 2012
Priority date	—
Expiry date	Oct 26, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/706
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.