Method and system for use in monitoring properties of patterned structures
US8289515B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2008 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Sep 21, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.