System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool
US8296687B2 · kind B2 · utility
8Cited by
20References
59Claims
0Family size
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Key dates
| Filing date | Sep 30, 2003 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Mar 2, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/80
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method, system and computer readable medium for analyzing a process performed by a semiconductor processing tool. The method includes inputting data relating to a process performed by the semiconductor processing tool, and inputting a first principles physical model relating to the semiconductor processing tool. First principles simulation is performed using the input data and the physical model to provide a first principles simulation result; and the first principles simulation result is used to determine a fault in the process performed by the semiconductor processing tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.