Removal of metal contaminant deposited on quartz member of vertical heat processing apparatus
US8298341B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2009 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Jul 24, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C23/0075
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method is used for removing a metal contaminant deposited on a quartz member selected from the group consisting of a reaction tube, wafer boat, and heat-insulating cylinder of a vertical heat processing apparatus for a semiconductor process. The method includes obtaining the quartz member unattached to the vertical heat processing apparatus; then, performing diluted hydrofluoric acid cleaning of cleaning the quartz member by use of diluted hydrofluoric acid; then, performing first purified water cleaning of cleaning the quartz member by use of purified water; then, performing hydrochloric acid cleaning of cleaning the quartz member by use of hydrochloric acid; and then, performing second purified water cleaning of cleaning the quartz member by use of purified water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.