Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition
US8299286B2 · kind B2 · utility
2Cited by
123References
9Claims
0Family size
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Key dates
| Filing date | Dec 4, 2007 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Nov 4, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/408
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A β-diketonate alkoxide metal compound and a source reagent composition are provided. The β-diketonate alkoxide metal compound may include a metal M selected from Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Ti, Zr, Hf, Pr, V, Nb, Ta, Nd, Cr, W, Pm, Mn, Re, Sm, Fe, Ru, Eu, Co, Rh, Ir, Gd, Ni, Tb, Cu, Dy, Ho, Al, Tl, Er, Sn, Pb, Tm, Bi, Lu, Th, Pd, Pt, Ga, In, Au, Ag, Li, Na, K, Rb, Cs, Mo, and Yb. The metal may be complexed to at least one alkoxide ligand and one β-diketonate ligand.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.