Diffuser plate with slit valve compensation
US8328939B2 · kind B2 · utility
715Cited by
125References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2007 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Feb 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32596
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention generally comprises a diffuser plate for a PECVD chamber. The diffuser plate comprises a plurality of hollow cathode cavities. The edge of the diffuser plate that will reside closest to a slit valve within a processing chamber may have the shape and/or size of the hollow cathode cavities adjusted to compensate for the proximity to the slit valve. By adjusting the shape and/or size of the hollow cathode cavities closest to the slit valve, the diffuser plate may permit a uniform plasma distribution across the processing chamber and thus, a uniform film thickness upon a substrate during a PECVD process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.