Patent · US Active

High transmission, high aperture catadioptric projection objective and projection exposure apparatus

US8345222B2 · kind B2 · utility

0Cited by

8References

22Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Daniel Kraehmer · Aalen, DE
Ralf Mueller · Germersheim, DE
Thomas Schicketanz · Aalen, DE
Wilhelm Ulrich · Aalen, DE
Alexander Epple · Aalen, DE

Key dates

Filing date	Oct 16, 2009
Grant date	Jan 1, 2013
Priority date	—
Expiry date	Jun 11, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70341
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.