Patent · US Active

Transforming metrology data from a semiconductor treatment system using multivariate analysis

US8346506B2 · kind B2 · utility

2Cited by

7References

4Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Vi Vuong · Fremont, US
Junwei Bao · Los Altos, US
Yan Chen · Cupertino, US
Heiko Weichert · Utzberg, DE
Sebastien Egret · Lumbin, FR

Key dates

Filing date	Apr 11, 2012
Grant date	Jan 1, 2013
Priority date	—
Expiry date	Apr 11, 2032

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/215
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Metrology data from a semiconductor treatment system is transformed using multivariate analysis. In particular, a set of metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. One or more essential variables for the obtained set of metrology data is determined using multivariate analysis. A first metrology data measured or simulated for one or more substrates treated using the treatment system is obtained. The first obtained metrology data is not one of the metrology data in the set of metrology data earlier obtained. The first metrology data is transformed into a second metrology data using the one or more of the determined essential variables.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.