Apparatus including heating source reflective filter for pyrometry
US8367983B2 · kind B2 · utility
9Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2009 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Jun 19, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.