Radiation source, lithographic apparatus, and device manufacturing method
US8368032B2 · kind B2 · utility
5Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 25, 2010 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Apr 3, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.