Patent · US Active

Uniformity of a scanned ion beam

US8378313B2 · kind B2 · utility

0Cited by

6References

21Claims

0Family size

Assignee

Axcelis Technologies, Inc. · US

Inventors

Edward C. Eisner · Lexington, US
Andy Ray · Newburyport, US
Bo H. Vanderberg · Gloucester, US

Key dates

Filing date	Mar 31, 2011
Grant date	Feb 19, 2013
Priority date	—
Expiry date	Apr 18, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/30483
WIPO fieldEngines, pumps, turbines
WIPO sectorMechanical engineering

Abstract

One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.