Edward C. Eisner
25Patents
5h-index
23Co-inventors
65Inventor score
Filing activity: Dec 6, 2005 → Dec 19, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7399980B2 | Systems and methods for beam angle adjustment in ion implanters | Electricity | 11 | Active |
| US7227160B1 | Systems and methods for beam angle adjustment in ion implanters | Electricity | 9 | Active |
| US7615763B2 | System for magnetic scanning and correction of an ion beam | Electricity | 6 | Active |
| US8637838B2 | System and method for ion implantation with improved productivity and uniformity | Electricity | 6 | Active |
| US7589333B2 | Methods for rapidly switching off an ion beam | Electricity | 5 | Active |
| US8089052B2 | Ion source with adjustable aperture | Electricity | 4 | Active |
| US9679739B2 | Combined electrostatic lens system for ion implantation | Electricity | 3 | Active |
| US7566886B2 | Throughput enhancement for scanned beam ion implanters | Electricity | 3 | Active |
| US7550751B2 | Ion beam scanning control methods and systems for ion implantation uniformity | Electricity | 3 | Active |
| US10553392B1 | Scan and corrector magnet designs for high throughput scanned beam ion implanter | Electricity | 2 | Active |
| US7453074B2 | Ion implanter with ionization chamber electrode design | Electricity | 2 | Active |
| US8008636B2 | Ion implantation with diminished scanning field effects | Electricity | 2 | Active |
| US8168941B2 | Ion beam angle calibration and emittance measurement system for ribbon beams | Electricity | 1 | Active |
| US10037877B1 | Ion implantation system having beam angle control in drift and deceleration modes | Electricity | 1 | Active |
| US8963107B2 | Beam line design to reduce energy contamination | Electricity | 1 | Active |
| US11114270B2 | Scanning magnet design with enhanced efficiency | Electricity | 1 | Active |
| US8653486B2 | Method and apparatus for improved uniformity control with dynamic beam shaping | Electricity | 1 | Active |
| US10483086B2 | Beam profiling speed enhancement for scanned beam implanters | Electricity | 1 | Active |
| US8421039B2 | Method and apparatus for improved uniformity control with dynamic beam shaping | Electricity | 1 | Active |
| US9620327B2 | Combined multipole magnet and dipole scanning magnet | Electricity | 0 | Active |
| US11037754B2 | Scan and corrector magnet designs for high throughput scanned beam ion implanter | Electricity | 0 | Active |
| US10573485B1 | Tetrode extraction apparatus for ion source | Electricity | 0 | Active |
| US7858955B2 | System and method of controlling broad beam uniformity | Electricity | 0 | Active |
| US8803110B2 | Methods for beam current modulation by ion source parameter modulation | Electricity | 0 | Active |
| US8378313B2 | Uniformity of a scanned ion beam | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.