Wide process range library for metrology
US8381140B2 · kind B2 · utility
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26Claims
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Key dates
| Filing date | Feb 11, 2011 |
| Grant date | Feb 19, 2013 |
| Priority date | — |
| Expiry date | Mar 11, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods of generating wide process range libraries for metrology are described. For example, a method includes generating a first library having a first process range for a first parameter. A second library is generated having a second process range for the first parameter. The second process range is overlapping with the first process range. The second library is stitched to the first library to generate a third library having a third process range for the first parameter. The third process range is wider than each of the first and second process ranges.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.