Lithographic apparatus and device manufacturing method
US8427629B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2010 |
| Grant date | Apr 23, 2013 |
| Priority date | — |
| Expiry date | Mar 16, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.