Catadioptric projection objective

US8446665B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Alexander Epple · Aalen, DE
• Vladimir Kamenov · Oberkochen, DE
• Toralf Gruner · Hennef (Sieg), DE
• Thomas Schicketanz · Aalen, DE

Key dates

• Filing date: Sep 18, 2009
• Grant date: May 21, 2013
• Expiry date: Nov 12, 2031

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70275
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9). The objective includes a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17), and a third partial objective (19) imaging the second intermediate image onto the image field. The second partial objective is a catadioptric objective having exactly one concave mirror and having at least one lens (L21, L22). A first folding mirror (23) deflects the radiation from the object plane toward the concave mirror and a second folding mirror (25) deflects the radiation from the concave mirror toward the image plane. At least one surface of a lens (L21, L22) of the second partial objective has an antireflection coating having a reflectivity of less than 0.2% for an operating wavelength of between 150 nm and 250 nm and for an angle-of-incidence range of between 0° and 30°. As an alternative or in addition, all the surfaces of the lenses of the second partial objective are configured su…