Patent · US Active

Selective etch back process for carbon nanotubes intergration

US8449781B2 · kind B2 · utility

0Cited by
8References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 22, 2010
Grant dateMay 28, 2013
Priority date—
Expiry dateFeb 9, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/30
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present disclosure relates to a method for selectively etching-back a polymer matrix to expose tips of carbon nanotubes comprising:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.