Lithographic apparatus and method
US8451423B2 · kind B2 · utility
7Cited by
3References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 17, 2009 |
| Grant date | May 28, 2013 |
| Priority date | — |
| Expiry date | Nov 29, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.