Patent · US Active

Polishing pad with partially recessed window

US8475228B2 · kind B2 · utility

11Cited by

11References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Dominic J. Benvegnu · La Honda, US
Boguslaw A. Swedek · Cupertino, US
Jimin Zhang · San Jose, US

Key dates

Filing date	May 12, 2011
Grant date	Jul 2, 2013
Priority date	—
Expiry date	May 12, 2031

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB24B49/12
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.