Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample
US8481980B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2008 |
| Grant date | Jul 9, 2013 |
| Priority date | — |
| Expiry date | Nov 11, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.